{"id":319,"date":"2009-02-17T21:28:30","date_gmt":"2009-02-18T05:28:30","guid":{"rendered":"http:\/\/betasights.net\/wordpress\/?p=319"},"modified":"2009-02-17T21:28:30","modified_gmt":"2009-02-18T05:28:30","slug":"metrosol-joins-sematech-for-hkmg-rd-at-cnse","status":"publish","type":"post","link":"http:\/\/www.betasights.net\/wordpress\/?p=319","title":{"rendered":"Metrosol joins SEMATECH for HKMG R&#038;D at CNSE"},"content":{"rendered":"<p><a href=\"http:\/\/www.metrosol.com\/\" target=\"_blank\">Metrosol<\/a> has joined <a href=\"http:\/\/www.sematech.org\/research\/materials.htm\" target=\"_blank\">SEMATECH\u2019s Front End Process Technologies Program<\/a> at the <a href=\"http:\/\/cnse.albany.edu\/\" target=\"_blank\">College of Nanoscale Science and Engineering (CNSE) of the University at Albany<\/a> to address metrology and data-analysis solutions for 45nm node and beyond IC fabs. The joint partnership will expand on current work to develop inline metrology techniques to monitor the thickness and composition of high-k (HK) dielectric gate and memory stacks. Metrosol\u2019s vacuum ultraviolet spectroscopic reflectometry (VUV-SR) tool will provide the accurate characterization necessary for inline metrology of advanced logic and memory applications for future technology generations.<\/p>\n<p>\u201cOur VUV-SR technology offers the ability to simultaneously measure thicknesses and compositions of individual layers<a href=\"http:\/\/betasights.net\/wordpress\/wp-content\/uploads\/2009\/02\/metrosol_spectra_v1.jpg\"><img loading=\"lazy\" decoding=\"async\" class=\"size-full wp-image-323 alignright\" title=\"metrosol_spectra_v1\" src=\"http:\/\/betasights.net\/wordpress\/wp-content\/uploads\/2009\/02\/metrosol_spectra_v1.jpg\" alt=\"\" width=\"200\" height=\"151\" \/><\/a> within the high-k dielectric stacks. Our high throughput provides advanced inline process control capability that allows for greater statistical sampling, more accurate information, and faster problem resolution,\u201d said <a href=\"http:\/\/www.solid-state.com\/display_article\/301546\/5\/WNART\/none\/TETAK\/VUV-Metrology-sees-ultra-thin-films\/\" target=\"_blank\">Kevin Fahey, Metrosol\u2019s CEO<\/a>.<\/p>\n<p>SEMATECH and Metrosol plan to build optical models for interfacial layers, HKMG stacks, and dielectric capping layers, so that reliable thickness and composition measurements may be performed inline using Metrosol\u2019s VUV-SR technology for different logic- and memory-based applications. <a href=\"http:\/\/www.pennwellblogs.com\/sst\/eds_threads\/labels\/XPS.php\" target=\"_blank\">Metrosol\u2019s VUV system has already been shown<\/a> to resolve HfSiOx gate dielectric composition independent of thickness (<em>see figure<\/em>).<\/p>\n<p>\u201cThis is another major step in developing practical and inline advanced physical characterization methods to support emerging technologies currently under development in SEMATECH\u2019s Front End Processes program,\u201d said <a href=\"http:\/\/www.sematech.org\/corporate\/news\/releases\/20050608.htm\" target=\"_blank\">Raj Jammy, SEMATECH vice president of emerging technology<\/a>. \u201cMetrosol is a strong, trusted partner, and its VUV measurement technology complements our own technical expertise, as we work together to extend CMOS logic and memory technologies.\u201d <em>\u2013E.K. <\/em><\/p>\n","protected":false},"excerpt":{"rendered":"<p>Metrosol has joined SEMATECH\u2019s Front End Process Technologies Program at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany to address metrology and data-analysis solutions for 45nm node and beyond IC fabs. The joint partnership will expand on current work to develop inline metrology techniques to monitor the thickness and composition [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[9,3,4,8],"tags":[118,465,41,40,466,13,164,76],"class_list":["post-319","post","type-post","status-publish","format-standard","hentry","category-equipment","category-manufacturing-fabrication-line","category-integrated-circuit","category-market-segment","tag-45nm","tag-manufacturing-fabrication-line","tag-high-k","tag-hk","tag-integrated-circuit","tag-metrology","tag-mg","tag-rd"],"_links":{"self":[{"href":"http:\/\/www.betasights.net\/wordpress\/index.php?rest_route=\/wp\/v2\/posts\/319","targetHints":{"allow":["GET"]}}],"collection":[{"href":"http:\/\/www.betasights.net\/wordpress\/index.php?rest_route=\/wp\/v2\/posts"}],"about":[{"href":"http:\/\/www.betasights.net\/wordpress\/index.php?rest_route=\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"http:\/\/www.betasights.net\/wordpress\/index.php?rest_route=\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"http:\/\/www.betasights.net\/wordpress\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=319"}],"version-history":[{"count":8,"href":"http:\/\/www.betasights.net\/wordpress\/index.php?rest_route=\/wp\/v2\/posts\/319\/revisions"}],"predecessor-version":[{"id":328,"href":"http:\/\/www.betasights.net\/wordpress\/index.php?rest_route=\/wp\/v2\/posts\/319\/revisions\/328"}],"wp:attachment":[{"href":"http:\/\/www.betasights.net\/wordpress\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=319"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"http:\/\/www.betasights.net\/wordpress\/index.php?rest_route=%2Fwp%2Fv2%2Fcategories&post=319"},{"taxonomy":"post_tag","embeddable":true,"href":"http:\/\/www.betasights.net\/wordpress\/index.php?rest_route=%2Fwp%2Fv2%2Ftags&post=319"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}