Tuesday, April 5th, 2011
Prof. Masato Shibuya was awarded the JSAP Takuma Award 2011 for invention of the phase-shift mask (PSM) and opening the field of advanced lithography, as reported by independent PSM inventor Marc Levenson.
JSAP 2011 Takuma Award to Masato Shibuya
Tags: Advanced Lithography, fab, IC, JSAP, Levenson, litho, mask, OAI, OPC, PSM, RET, Shibuya, SMO, SRAF, Takuma
Posted in Equipment, fab, IC, Material, MEMS, Product, Service | Comments Off on JSAP 2011 Takuma Award to Masato Shibuya
Tuesday, September 14th, 2010
E-beam Initiative adds four members and starts on Design for E-beam (DFEB) for mask makng for ICs to reduce mask costs at 22nm and below.
E-beam Initiative speeds mask making
Tags: 193i, 22nm, 32nm, BACUS, CDU, D2S, DFM, e-Beam Initiative, EbDW, IC, Intel, litho, mask, node, SPIE, SRAF
Posted in Equipment, fab, IC, Material, Product, Service | Comments Off on E-beam Initiative speeds mask making
